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CVD尾氣處理設備
產品描述
在半導體制造過程中CVD設備產生的有毒氣體通過燃燒、高溫裂解等方式進行有效分解，冷卻后經多層水洗、噴淋后進入中央廢氣處理；產生的雜質將通過收集系統集中處理。 處理objects:SIH4化學氣相沉積（CVD）設備廢氣中的NH3、PH3、PD3、SF6、CHF3。
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