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Lithography machine
Product description
NSR-2205i9C Lithography machine
•Resolution:    0.45um
•N.A:   0.57
•Exposure light source:   365nm
•Magnification:  1:5
•Exposure field size: 20mm*20mm
•Overlay accuracy:  90nm
•Wafer size:    6 inches
•Capacity:      50 pcs/hour
NSR-2205i12D Lithography machine
•Resolution:   0.35um
•N.A:    0.68
•Exposure light source: 365nm
•Magnification:  1:5
•Exposure field size:22mm*22mm
•Overlay accuracy: 55nm
•Wafer size: 8 inches
•Capacity: 70 pcs/hour

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